ASML receives first orders for new generation euv chip machines
ASML has received four orders for so-called high-NA euv machines, which will enable manufacturers to apply structures to wafers on an even smaller scale in the future. Delivery should take place at the end of 2021.
These are orders for research purposes from three ‘large semiconductor manufacturers’ that ASML does not specify by name. The largest manufacturers are TSMC, Samsung, Intel and Global Foundries. ASML has an additional eight options on the high-NA systems. The company expects to be able to deliver the machines in 2024
The systems have an NA of 0.5, where the current euv systems have an NA of 0.33. NA stands for numerical aperture or opening angle of the lens. The larger this value, the smaller the structures that can be projected onto the wafers. ASML has acquired an interest in Carl Zeiss SMT to guarantee the production of optical systems with higher NA.
ASML expects chip manufacturers to use euv machines for large-scale chip production between the end of this year and early next year. That will be for the 7nm node. The smaller node after that can also be produced with the current euv generation. The high-NA successor can then also join two to three nodes, ASML thinks.
To get euv ready for production, the throughput still needs to be increased. ASML aims for an average throughput of 125 wafers per hour. According to the company, that number was achieved at a customer and in ASML’s own factory, an NXE:3400 machine has now achieved 140 wafers per hour. The aim is to achieve a throughput of 185 wafers per hour at high-NA.
The chip industry is gearing up for the transition to euv machines, as the limits of today’s immersion lithography are approaching: from the 7nm node, multiple patterning, multiple exposures for smaller processes, is likely to be too time consuming and expensive. In immersion lithography, the patterns in front of the chip are projected onto the wafer surface by light with a wavelength of 193nm, with a layer of water between the lenses and the wafer providing additional light refraction so that small structures can be applied. Euv machines use extreme ultraviolet light with a wavelength of 13.5nm so that smaller structures can be applied in one go.
ASML delivered three euv machines to customers in the first quarter and received nine new orders. The company from Veldhoven expects to deliver at least twenty EUV machines this year and next year. ASML’s turnover rose to 2.3 billion euros last quarter, compared to 1.9 billion euros last year. The quarterly profit amounted to 540 million euros.